SACHEM to highlight new production facility in China and feature SelectEtch™ product line at exhibit. Austin, TX – March 14, 2008 -SACHEM, Inc. announced today that it will present a technical paper and exhibit at SEMICON China 2008 at the Shanghai New International Expo Centre, Shanghai, China. The focus of the exhibit will be on…
Author: Erica Tarbutton
SACHEM To Present Technical Paper on Improved Silicon Etching for Sub-65nm Devices
New technology for planar-selective crystalline silicon etch delivers increased advantages. Austin, TX – February 18, 2008 – SACHEM, Inc. announced today that an advanced technology paper will be delivered at the Semiconductor International Wafer Cleaning Seminar in Tokyo. The one-day technical seminar will focus on new challenges and technologies in wafer cleaning. The seminar is…
SACHEM Appoints Thomas J. Mooney as President for SACHEM Asia
SACHEM, Inc. is pleased to announce Thomas J. (Tom) Mooney as President, SACHEM Asia. Austin, TX – February 4, 2009 – SACHEM, Inc. is pleased to announce Thomas J. (Tom) Mooney as President, SACHEM Asia. Tom has been Senior Vice President of SACHEM Americas for 8 years and has been with SACHEM for 25 years. Tom has…
SACHEM, Inc. Announces Joint Venture with Nagase & Co. Offering TMAH Recycle Technology
SACHEM’s Mobius System™ is “green” technology designed to protect environment through minimization of chemical waste and water consumption while providing safe, readily available supply of high quality TMAH. Osaka, Japan – January 25, 2008 – SACHEM, Inc., the world’s leader in Tetramethylammonium Hydroxide (TMAH) development, recycle and production technology is pleased to announce the formation…
SACHEM To Exhibit at SEMICON Korea 2008 in Seoul, Korea
SACHEM announced today that it will exhibit at Semicon Korea 2008, Booth No. 1750. Austin, TX – January 15, 2008 – SACHEM, Inc. announced today that it will exhibit at Semicon Korea 2008 at the COEX Exhibition Centre (Booth No. 1750) in Seoul, Korea. The focus of the exhibit will be on SACHEM’s Front End…
SACHEM ExpandsSelectEtch™ Product Line with SelectEtch™ SE-1430
Planar-Selective Silicon Etchant allows device manufacturers to create more precise structures in crystalline silicon through enhanced silicon recess feature formation and improved surface roughness characteristics. (Austin, TX)- January 8, 2008 – SACHEM, Inc. announced today the introduction of SelectEtchTM SE-1430, a high performance formulation for planar-selective etching of crystalline silicon in advanced integrated circuits. SelectEtchTM…
