Austin, TX – April 7, 2009 – SACHEM has published an article titled, “Use of TMAH in Dry Film Resist Formulations” on its website. The white paper outlines information on using Tetramethylammonium Hydroxide and Choline in resist formulations. The study was performed by Alfred P. Orio, President and Director of Process Analytical Services, Inc. The study notes that TMAH provides…
