Planar-Selective Silicon Etchant allows device manufacturers to create more precise structures in crystalline silicon through enhanced silicon recess feature formation and improved surface roughness characteristics. (Austin, TX)- January 8, 2008 – SACHEM, Inc. announced today the introduction of SelectEtchTM SE-1430, a high performance formulation for planar-selective etching of crystalline silicon in advanced integrated circuits. SelectEtchTM…
