Selective TEOS etchant offers shorter process times, enhanced selectivity and greater protection for polysilicon and gate oxide features. (Austin, TX) November 1, 2007- SACHEM, Inc. announced today the introduction of SelectEtchTM SE-1130, a new high performance selective etching and cleaning product for selective etching of TEOS-based oxides in advanced integrated circuits. SelectEtchTM SE-1130’s pioneering technology incorporates specifically designed functional raw materials…
This website uses cookies so that we can provide you with the best user experience possible. Cookie information is stored in your browser and performs functions such as recognizing you when you return to our website and helping our team to understand which sections of the website you find most interesting and useful.