SACHEM creates components for the photoresist stripping process. Photoresist stripping is the last step in the lithography process. Once the photoresist has been deposited, exposed, developed, and the pattern has been transferred to the underlying film, the photoresist has to be removed. Envure ST™ products are used in the non-aqueous formulations used in this strip process, efficiently removing the organic photoresist without damaging the underlying films.
Available products for photoresist stripping
Stripper formulary for TFT
Tetramethylammonium Hydroxide (TMAH) 20% PG