Selective TEOS etchant offers shorter process times, enhanced selectivity and greater protection for polysilicon and gate oxide features. (Austin, TX) November 1, 2007- SACHEM, Inc. announced today the introduction of SelectEtchTM SE-1130, a new high performance selective etching and cleaning product for selective etching of TEOS-based oxides in advanced integrated circuits. SelectEtchTM SE-1130’s pioneering technology incorporates specifically designed functional raw materials…
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